Liquid crystal display and method for manufacturing the same

ABSTRACT

A liquid crystal display (LCD) is provided, a liquid crystal display comprising: a first substrate and a second substrate that are opposite to each other; a liquid crystal layer arranged between the first substrate and the second substrate; a light blocking pattern including a first light blocking pattern and a second light blocking pattern arranged to extend along one direction on the first substrate; and a column spacer formed on the first light blocking pattern on the first substrate, wherein the light blocking pattern includes an open portion disposed between the first light blocking pattern and the second light blocking pattern, and formed to be spaced apart from the column spacer for a predetermined distance.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based on and claims priority to Korean PatentApplication No. 10-2015-0113166, filed on Aug. 11, 2015 in the KoreanIntellectual Property Office, the disclosure of which is incorporatedherein in its entirety by reference.

BACKGROUND

1. Field

The present inventive concept relates to a liquid crystal display and amethod for manufacturing the same.

2. Description of the Prior Art

In general, a liquid crystal display includes an array substrate, anopposite substrate that is opposite to the array substrate, and a liquidcrystal layer interposed between the array substrate and the oppositesubstrate. Recently, a liquid crystal display having a hightransmittance that adopts a COA (Color-filter On Array) substrate, inwhich color filters are formed on an array substrate, has beendeveloped. In this case, misalignment may occur in the process ofcombining the COA substrate with the opposite substrate on which a lightblocking member is formed, and in order to prevent this misalignment, aBOA (Black matrix On Array) substrate in which the light blocking memberis formed on the COA substrate, has been developed. Further, a BCS(Black Column Spacer) for simultaneously forming a light blockingpattern and a column spacer that keeps a gap between the substrates withthe same material has been developed.

SUMMARY

The BCS structure has the advantages that the light blocking pattern andthe column spacer are simultaneously formed, and thus the processingtime, mask cost, and photoresist consumption can be reduced. However,the above-described process of forming the BCS structure generallyincludes a bake process for curing developed photoresist, and since thelight blocking pattern and the column spacer are integrally formed, thephotoresist may reflow after the bake process is performed. Accordingly,the shape of the column spacer may be unable to keep the originalconfiguration, but may reflow, and this may cause difficulty in formingthe column spacer with a desired height.

Accordingly, one subject to be solved by the present inventive conceptis to provide a liquid crystal display which includes a structure thatcan prevent or suppress deformation of the column spacer due to a reflowphenomenon in a process of simultaneously forming a light blockingpattern and the column spacer, and a method for manufacturing the liquidcrystal display.

Additional advantages, subjects, and features of the inventive conceptwill be set forth in part in the description which follows and in partwill become apparent to those having ordinary skill in the art uponexamination of the following or may be learned from practice of theinventive concept.

In one aspect of the present inventive concept, there is provided aliquid crystal display comprising: a first substrate and a secondsubstrate that are opposite to each other; a liquid crystal layerarranged between the first substrate and the second substrate; a lightblocking pattern including a first light blocking pattern and a secondlight blocking pattern arranged to extend along one direction on thefirst substrate; and a column spacer formed on the first light blockingpattern on the first substrate, wherein the light blocking pattern isincludes an open portion disposed between the first light blockingpattern and the second light blocking pattern, and formed to be spacedapart from the column spacer for a predetermined distance.

The liquid crystal display may further include a metal layer arranged ona lower portion of the open portion on the first substrate, wherein atleast a part of the open portion overlaps the metal layer.

The liquid crystal display may further include a gate wiring arranged ona lower portion of the open portion on the first substrate and includinga gate line and a gate electrode, wherein at least a part of the openportion overlaps the gate wiring.

The open portion may overlap a portion of the gate wiring in which thegate electrode is formed.

The first light blocking pattern and the second light blocking patternmay be separated from each other by the open portion.

The open portion may include a first open portion spaced apart from thecolumn spacer to one side for a predetermined distance, and a secondopen portion spaced apart toward the other side that is an opposite sideof the one side for a predetermined distance.

The first light blocking pattern may include an added portion thatprojects from an edge of the first light blocking pattern correspondingto the column spacer.

The width of the added portion may be from about 9 μm to about 10 μm.

In another aspect of the present inventive concept, there is provided aliquid crystal display comprising: a first substrate and a secondsubstrate that are opposite to each other;

-   -   a liquid crystal layer arranged between the first substrate and        the second substrate; a light blocking pattern including a first        light blocking pattern and a second light blocking pattern        arranged to extend along one direction on the first substrate;        and a column spacer formed on the first light blocking pattern        on the first substrate, wherein the light blocking pattern        includes a third light blocking pattern disposed between the        first light blocking pattern and the second light blocking        pattern, and formed to be spaced apart from the column spacer        for a predetermined distance, and a height of the third light        blocking pattern is lower than a height of the first light        blocking pattern and a height of the second light blocking        pattern.

The liquid crystal display may further includes a metal layer arrangedon a lower portion of the third light blocking pattern on the firstsubstrate, wherein at least a part of the third light blocking patternoverlaps the metal layer.

The liquid crystal display may further include a gate wiring arranged ona lower portion of the third light blocking pattern on the firstsubstrate and including a gate line and a gate electrode, wherein atleast a part of the third light blocking pattern overlaps the gatewiring.

The third light blocking pattern may overlap a portion of the gatewiring in which the gate electrode is formed.

The third light blocking pattern comprises a portion that is connectedto the first light blocking pattern and the second light blockingpattern.

In one another aspect of the present inventive concept, there isprovided a method for manufacturing a liquid crystal display,comprising: forming a light blocking layer on a first substrate; andsimultaneously forming a light blocking pattern and a column spacerthrough a process of patterning the light blocking layer using anexposure mask including a light transmission region, a first halftoneregion, and a light blocking region, wherein the light blocking patternincludes a first light blocking pattern and a second light blockingpattern formed to extend in one direction, and a portion having areduced thickness than the first light blocking pattern and a secondlight blocking pattern, the portion having a reduced thickness beingformed to be spaced apart from the column spacer between the first lightblocking pattern and the second light blocking pattern for apredetermined distance.

The method may further include forming a metal layer on a lower portionof the portion having a reduced thickness on the first substrate,wherein at least a part of the portion having a reduced thicknessoverlaps the metal layer.

The method may further include forming a gate wiring including a gateline and a gate electrode on a lower portion of the portion having areduced thickness on the first substrate, wherein at least a part of theopen portion overlaps the gate wiring.

The portion having a reduced thickness may overlap a portion of the gatewiring in which the gate electrode is formed.

The portion having a reduced thickness does not have the light blockinglayer.

The portion having a reduced thickness may include a first portionspaced apart from the column spacer to one side for a predetermineddistance, and a second portion spaced apart toward the other side thatis an opposite side of the one side for a predetermined distance.

The first light blocking pattern may include an added portion thatprojects from an edge of the first light blocking pattern correspondingto the column spacer.

According to the method for manufacturing a liquid crystal displayaccording to an embodiment of the present inventive concept, it ispossible to prevent or suppress deformation of the shape of a columnspacer due to a reflow phenomenon in a process of simultaneously forminga light blocking pattern and the column spacer.

The liquid crystal display according to an embodiment of the presentinventive concept includes a structure that can prevent or suppressdeformation of a column spacer due to a reflow phenomenon in a processof simultaneously forming a light blocking pattern and the columnspacer, and thus a predetermined step height level of the column spacercan be secured.

The effects according to the present inventive concept are not limitedto the contents as exemplified above, but further various effects areincluded in the description.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, features and advantages of the presentinventive concept will be more apparent from the following detaileddescription taken in conjunction with the accompanying drawings, inwhich:

FIG. 1 is a layout diagram of a liquid crystal display according to anembodiment of the present inventive concept;

FIG. 2 is a cross-sectional view taken along line III-II′ of FIG. 1;

FIG. 3 is a plan view explaining an arrangement between a light blockingpattern and a gate wiring of a liquid crystal display according to anembodiment of the present inventive concept;

FIG. 4 is a cross-sectional view taken along a line that corresponds toline II-II′ of FIG. 1 illustrating a liquid crystal display according toanother embodiment of the present inventive concept;

FIG. 5 is a plan view explaining an arrangement between a light blockingpattern and a gate wiring of a liquid crystal display according toanother embodiment of the present inventive concept;

FIGS. 6, 7, 8 and 9 are plan views explaining an arrangement between alight blocking pattern and a gate wiring of a liquid crystal displayaccording to still another embodiment of the present inventive concept;

FIGS. 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24 and 25are cross-sectional views of processing steps explaining a method formanufacturing a liquid crystal display according to an embodiment of thepresent inventive concept; and

FIG. 26 is a cross-sectional view explaining a process of forming alight blocking pattern and a column spacer in a method for manufacturinga liquid crystal display according to an embodiment of the presentinventive concept.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Reference will now be made in detail to exemplary embodiments, examplesof which are illustrated in the accompanying drawings, wherein likereference numerals refer to like elements throughout the specification.In this regard, the present exemplary embodiments may have differentforms and should not be construed as being limited to the descriptionsset forth herein. Accordingly, the exemplary embodiments are merelydescribed below, by referring to the figures, to explain aspects of thepresent description.

The description that one element is connected to or coupled to anotherelement includes both cases where the one element is directly connectedto the another element and where further another element is interposedbetween the elements. However, the description that one element isdirectly connected or directly coupled to another element indicates thatthere is no further another element between the elements. The term“and/or” includes any and all combinations of one or more of theassociated listed items.

A singular expression in the present specification also includes aplural expression. The terms “comprise” and/or “comprising” do notexclude the possibility of existence or addition of one or more othercomponents, steps, operations, and/or devices.

Hereinafter, embodiments of the present inventive concept will bedescribed with reference to the accompanying drawings.

FIG. 1 is a layout diagram of a liquid crystal display according to anembodiment of the present inventive concept, and FIG. 2 is across-sectional view taken along line II-IF of FIG. 1. FIG. 3 is a planview explaining an arrangement between a light blocking pattern and agate wiring of a liquid crystal display according to an embodiment ofthe present inventive concept.

Referring to FIGS. 1 to 3, a liquid crystal display 10 according to anembodiment of the present inventive concept includes a first substrate100, a second substrate 200 that is opposite to the first substrate 100,and a liquid crystal layer 300 interposed between the first substrate100 and the second substrate 200.

The first substrate 100 and the second substrate 200 may include aninsulating material, such as transparent glass, quartz, ceramic,silicon, or transparent plastic, and may be properly selected inaccordance with a need of a manufacturer. The first substrate 100 andthe second substrate 200 may be arranged opposite to each other.

In some embodiments, the first substrate 100 and the second substrate200 may be flexible substrates. That is, the first substrate 100 and thesecond substrate 200 may have flexibility, and thus can be, for example,rolled, folded, and/or bended.

On the first substrate 100, a plurality of gate wirings 102 and 104 anddata wirings 132, 134, and 136 may be arranged.

The gate wirings 102 and 104 may include a plurality of gate lines 102and a plurality of gate electrodes 104. The data wirings 132, 134, and136 may include a plurality of data lines 132, a plurality of sourceelectrodes 134, and a plurality of drain electrodes 136.

The gate wirings 102 and 104 and the data wirings 132, 134, and 136 maybe made of an aluminum-based metal, such as aluminum (Al) or an aluminumalloy, a silver-based metal, such as silver (Ag) or a silver alloy, acopper-based metal, such as copper (Cu) or a copper alloy, amolybdenum-based metal, such as molybdenum or a molybdenum alloy, chrome(Cr), titanium (Ti), or tantalum Ta). Further, the gate wirings 102 and104 and the data wirings 132, 134, and 136 may have a multilayerstructure that includes more than two conductive layers (notillustrated) having different physical properties. For example, oneconductive layer may be made of an aluminum-based metal, a silver-basedmetal, or a copper-based metal, and the other conductive layer may bemade of refractory metal such as a molybdenum-based metal, titanium, andtantalum. An example of such a combination may be a lower chrome layerand an upper aluminum layer, or a lower aluminum layer and an uppermolybdenum layer. However, the present inventive concept is not limitedthereto, and the gate wirings 102 and 104 and the data wirings 132, 134,and 136 may be formed of various kinds of metals and conductors.

Each gate line 102 may extend in a first direction, for example, along aboundary of pixels in a horizontal direction, and each data line 132 mayextend in a second direction, for example, along a boundary of pixels ina vertical direction. The gate lines 102 and the data lines 132 may bearranged to cross each other and define a pixel region. That is, thepixel region may be defined by a region that is surrounded by the gatelines 102 and the data lines 132.

In some embodiments, the data lines 132 may be periodically bent asillustrated in FIG. 1 to improve transmittance. However, this is merelyexemplary, and the shape of the data lines 132 according to the presentinventive concept is not limited thereto.

At least one gate electrode 104 is arranged to be connected to each gateline 102 for each pixel. The gate electrode 104 may be branched from thegate line 102 toward a semiconductor layer 122, or may be formed throughextension of the gate line 102. However, forming of the gate electrode104 is not limited thereto, but the gate electrode 104 may be defined ina region in which the gate line 102 overlaps the semiconductor layer 122on the extended path of the gate line 102.

At least one source electrode 134 is arranged to be connected to eachdata line 132 for each pixel. The source electrode 134 may be branchedfrom the data line 132 toward the semiconductor layer 122, or may beformed through extension of the data line 132. However, forming of thesource electrode 134 is not limited thereto, but the source electrode134 may be defined in a region in which the data line 132 overlaps thesemiconductor layer 122 on the extended path of the data line 132. Forexample, the source electrode 104 may not project from the data line132, but may be positioned substantially on the same line as the dataline 132. The drain electrode 136 may be arranged to be spaced apartfrom the source electrode 104 on the semiconductor layer 122, and may beelectrically connected to a pixel electrode 182 through a contact hole136 a formed through a first passivation layer 142, an organic layer154, and a second passivation layer 172.

A gate insulating layer 112 may be arranged between the gate wirings 102and 104 and the data wirings 132, 134, and 136. In an embodiment, thegate insulating layer 112 may be arranged on the gate wirings 102 and104, and the data wirings 132, 134, and 136 may be arranged on the gateinsulating layer 112. The gate insulating layer 112 may be made of, forexample, silicon nitride (SiN_(x)), silicon oxide (SiO₂), siliconoxynitride (SiON), or a laminated layer thereof. The gate insulatinglayer 112 may insulate the gate wirings 102 and 104 from the data lines132 positioned on upper portions of the gate wirings.

The semiconductor layer 122 may be arranged on the gate insulating layer112, and may be made of, for example, hydrogenated amorphous silicon orpolysilicon. The semiconductor layer 122 is arranged to overlap the gateelectrode 104 at least partly. The semiconductor layer 122 forms a thinfilm transistor together with the gate electrode 104, the sourceelectrode 134, and the drain electrode 136.

The semiconductor layer 122 may have various shapes, and for example,may be of an island type or a line type. FIG. 3 exemplifies that thesemiconductor layer 122 is of an island type, but is not limitedthereto. In the case where the semiconductor layer 122 is formed of anisland type, although not separately illustrated, the semiconductorlayer 122 may overlap the data wirings 132, 134, and 136.

On the semiconductor layer 122, a resistive contact layer, which iscomposed of n+ hydrogenated amorphous silicon that is highly doped withan n-type impurity, may be arranged. The ohmic contact layer 124 ispositioned between the lower semiconductor layer 122 and the uppersource electrode 134 and drain electrode 136 and serves to reducecontact resistance. In a similar manner to the semiconductor layer 122,the ohmic contact layer 124 may have various shapes, and for example,may be of an island type or a line type. In the case where thesemiconductor layer 122 is of an island type, the ohmic contact layer124 may also be of an island type, whereas in the case where thesemiconductor layer 122 is of a line type, the ohmic contact layer 124may also be of a line type. The ohmic contact layer 124, for example, asource ohmic contact layer and a drain ohmic contact layer, unlike thesemiconductor layer 122, may be spaced apart each other with a channelregion interposed therebetween, and thus the lower semiconductor layer122 may be exposed. In the semiconductor layer 122, a channel may beformed in a region in which the source electrode 134 and the drainelectrode 136 are spaced apart from each other to face each other.

If a gate-on signal is applied to the gate electrode 104 and a channelis formed in the semiconductor layer 122, the thin film transistor isturned on, and thus the drain electrode 136 can receive a data signalfrom the source electrode 134 and transfer the received data signal to apixel electrode 192.

The passivation layer 142 may be arranged on the data wirings 132, 134,and 136 and the exposed semiconductor layer 122. The contact hole 136 athat exposes at least a portion of the drain electrode 136 may be formedon the first passivation layer 142 and the organic layer 154 to bedescribed later. At least a portion of the drain electrode 136 that isexposed through the contact hole 136 a may come in contact with thepixel electrode 182. Through this, the drain electrode 136 and the pixelelectrode 182 may be electrically connected/contacted.

The first passivation layer 142 may include, for example, an inorganicmaterial, such as silicon nitride or silicon oxide, or a material ofa-Si:C:O or a-Si:O:F that is formed by PECVD (Plasma Enhanced ChemicalVapor Deposition).

The organic layer 154 may be arranged on the first passivation layer142. The organic layer 154 has superior planarization characteristics,and may include a material having photosensitivity. The organic layer154 includes the contact hole 136 a that exposes at least a portion ofthe drain electrode 136.

In some embodiments, a color filter 152 may be arranged between theorganic layer 154 and the first passivation layer 142 as illustrated inFIG. 2. The color filter 152 may include an R (Red) color filter, a G(Green) color filter, and a B (Blue) color filter. The R, G, and B colorfilters are formed on respective pixels to form R, G, and B pixels. Thecolor filter 152 may include a photosensitive organic layer includingpigment. On the color filter 152, the organic layer 154 may be arrangedto perform planarization of the R, G, and B color filters to remove stepheights thereof. The color filter 152 may be covered by the organiclayer 154. That is, the color filter 152 may be covered by the organiclayer 154 to remove the exposed portion. However, this is merelyexemplary, and the present inventive concept is not limited to such astructure as described above.

A common electrode 162 may be arranged on the organic layer 154. Thecommon electrode 162 may receive a common voltage and may control thealignment direction of liquid crystal molecules included in the liquidcrystal layer 300 together with a pixel electrode 182 which will bedescribed later. The common electrode 162 includes an opening thatexposes a region in which the contact hole 136 a is formed. That is, atleast a portion of the drain electrode 136 may be exposed through theopening that is formed on the common electrode 162. The common electrode162 may be integrally formed through the whole pixel region that issurrounded by the gate line 102 and the data line 132 except for theopening. The common electrode 162 may be implemented by a transparentconductive material, such as ITO (Indium Tin Oxide) or IZO (Indium ZincOxide), but is not limited thereto.

The second passivation layer 172 may be arranged on the common electrode162 and the organic layer 154. The second passivation layer 172 mayinclude an opening that exposes a region in which the contact hole 136 ais formed. That is, at least a portion of the drain electrode 136 may beexposed through the opening formed on the second passivation layer 172.The second passivation layer 172 may be made of an inorganic insulatingmaterial. For example, the second passivation layer 172 may includesilicon nitride or silicon oxide. The second passivation layer 172 maybe positioned between the pixel electrode 182 and the common electrode162 to perform insulation between the pixel electrode 182 and the commonelectrode 162.

The pixel electrode 182 may be arranged on the second passivation layer172 for each unit pixel. At least a part of the pixel electrode 182 mayoverlap the common electrode 162. A portion of the pixel electrode 182is arranged inside the contact hole 136 a. A portion of the pixelelectrode 182 that is arranged inside the contact hole 136 a may come incontact with the drain electrode 136 to be electrically connected to thedrain electrode 136.

In some embodiments, the pixel electrode 182 may include a plurality ofbranch electrodes 184 that overlap the common electrode 162, and a slit186 may be formed between the neighboring branch electrodes 184. Thebranch electrodes 184 may be tilted to form an oblique angle against thevertical direction, and may be bent on a horizontal center line (notillustrated) of the pixel electrode 182. Accordingly, the pixelelectrode 182 may be divided into a plurality of domains in which thebranch electrodes 184 have different tilted directions. For example, onthe basis of the horizontal center line, the upper branch electrodes 184may extend in upper right direction and the lower branch electrodes 184may extend in lower right direction. The branch electrodes 184 of thepixel electrode 182 may extend substantially in parallel to the dataline 132. However, the shape of the pixel electrode 182 illustrated inFIG. 1 is exemplary, and the present inventive concept is not limitedthereto. According to a need of a manufacturer, the shape of the slit186 may be variously selected. For example, the pixel electrode 182 mayinclude a plurality of empty slits 186 having various shapes including afish-bone shape.

If a data voltage is applied to the pixel electrode 182, an electricfield is formed between the pixel electrode 182 and the lower commonelectrode 162. That is, the pixel electrode 182 may form an electricfield together with the common electrode 162 to rotate liquid crystalmolecules included in the liquid crystal layer 300. The pixel electrode182 may include a transparent conductive material, such as ITO or IZO,but is not limited thereto.

In another embodiment, the pixel electrode 182 may have a plate shape.In this case, the common electrode 162 may include a plurality of branchelectrodes (not illustrated) that overlap the pixel electrode 182.However, this is exemplary, the structure and the arrangement of thepixel electrode 182 and the common electrode 162 may be variously set.

A light blocking pattern 192 may be arranged on the second passivationlayer 172 and the pixel electrode 182. The light blocking pattern 192serves to prevent light leakage. The light blocking pattern 192 may bearranged in a thin film transistor region and a non-pixel region(between pixels or between the gate line and the data line).

In some embodiments, the light blocking pattern 192 may be implementedto include a shape that extends in the same direction as the extensiondirection of the gate line 102. The light blocking pattern 192 may bearranged in a region of the gate line 102 and the gate electrode 104.However, this is exemplary, and in another embodiment, the lightblocking pattern 192 may be further arranged even in a region of thedata line 132 to be implemented in a lattice shape.

In some embodiments, the width W2 of the light blocking pattern 192 maybe wider than the width W3 of a region in which the gate electrode 104among the gate wirings 102 and 104 is formed as illustrated in FIG. 3.However, this is exemplary, and in another embodiment, the width of thelight blocking pattern 192 may be equal to or narrower than the width ofthe region in which the gate electrode 104 among the gate wirings 102and 104 is formed.

In some embodiments, a part of the light blocking pattern 192 may bearranged in the contact hole 136 a as illustrated in FIGS. 1 and 2.However, this is exemplary, and the arrangement of the light blockingpattern 192 is not limited to such a structure.

The light blocking pattern 192 may include a black organic polymermaterial including black dye or pigment or metal (metal oxide), such aschrome or chrome oxide.

Column spacers 194 a and 194 b are formed to keep a gap between thefirst substrate 100 and the second substrate 200, and may include a maincolumn spacer 194 a and a sub-column spacer 194 b.

An end portion of the main column spacer 194 a in the liquid crystallayer 300 may be arranged relatively more adjacent to the secondsubstrate 200 than an end portion of the sub-column spacer 194 b. Forexample, as illustrated in FIG. 2, the end portion of the main columnspacer 194 a may come in contact with the second substrate 200, and thesub-column spacer 194 b may be arranged to be spaced apart from thesecond substrate 200 for a predetermined distance. Accordingly, a gapbetween the first substrate 100 and the second substrate 200 may beprimarily kept by the main column spacer 194 a, and if more pressure isapplied to the second substrate, the gap between the first substrate 100and the second substrate 200 may be secondarily kept by the sub-columnspacer 194 b.

FIG. 2 exemplifies that the end portion of the main column spacer 194 acomes in contact with the second substrate 200, but is not limitedthereto. It is also possible that the end portion of the main columnspacer 194 a is arranged to be spaced apart from the second substrate200 and is arranged relatively more adjacent to the second substrate 200than the end portion of the sub-column spacer 194 b.

Referring to FIGS. 1 and 2, the column spacers 194 a and 194 b may bearranged between a thin film transistor of a first pixel and a thin filmtransistor of a second pixel that is adjacent to the first pixel. Atleast parts of the column spacers 194 a and 194 b may overlap the gatewirings 102 and 104 and the data wirings 132, 134, and 136. However,this is exemplary, and the arrangement of the column spacers 194 a and194 b is not limited thereto.

In the embodiment of FIGS. 1 to 3, it is exemplified that the maincolumn spacer 194 a is arranged in a first pixel region and thesub-column spacer 194 b is arranged in a second pixel region that isadjacent to the first pixel. However, the arrangement is not limitedthereto, but the liquid crystal display 10 according to an embodiment ofthe present inventive concept may include pixels in which the columnspacers 194 a and 194 b are not arranged.

On surfaces of the first substrate 100 and the second substrate 200which contact the liquid crystal layer 300, alignment layers (notillustrated) may be arranged. That is, alignment layers (notillustrated) that can align the liquid crystal layer 300 may be arrangedon the pixel electrode 182, the second passivation layer 172, the lightblocking pattern 192, and the column spacers 194 a and 194 b.

Between the first substrate 100 and the second substrate 200, the liquidcrystal layer 300 that includes liquid crystal molecules (notillustrated) having positive or negative dielectric anisotropy may beinterposed.

In some embodiments, the column spacers 194 a and 194 b may be made ofthe same material as the material of the light blocking pattern 192. Thecolumn spacers 194 a and 194 b and the light blocking pattern 192 may besimultaneously formed through one patterning process through halftonemask or slit mask exposure. That is, the column spacers 194 a and 194 band the light blocking pattern 192 may be simultaneously formed of thesame material. The light blocking pattern 192 may include a portion thatis integrally formed with the column spacers.

If it is assumed that a panel is bent by an external force in the casewhere the light blocking pattern 192 and the column spacers 194 a and194 b are simultaneously formed, scratch may occur on an alignment layerPI that is arranged on the second substrate 200 by the column spacers194 a and 194 b to cause light leakage.

Accordingly, the light blocking pattern 192 of the liquid crystaldisplay 10 according to an embodiment of the present inventive conceptmay include added portions 196 a and 196 b to prevent light leakage dueto the above-described scratch. The added portions 196 a and 196 b mayprotrude from imaginary lines which connect horizontal edges of thelight blocking patterns. The added portions 196 a and 196 b may protrudefrom the imaginary lines to an upper direction and a lower direction inregions corresponding to the column spacers 194 a and 194 b. In otherwords, the added portions 196 a and 196 b may be protrusions that areprotruded from the imaginary lines toward adjacent pixel areas and areformed on regions corresponding to the column spacers 194 a and 194 b .The added portions 196 a and 196 b may be formed on both sides of thecolumn spacers 194 a and 194 b and protruded toward adjacent pixel areasfrom the imaginary lines. According to another embodiment, the addedportions 196 a and 196 b may be formed on both sides of the main columnspacers 194 a only. In other word, the added portions 196 a and 196 bmay not be formed on sides of the sub-column spacers 194 b.

The added portions 196 a and 196 b may be integrally formed with thelight blocking pattern 192 at the same time through one patterningprocess. The added portions 196 a and 196 b and the light blockingpattern 192 may be formed of the same material. That is, the lightblocking pattern 192, the added portions 196 a and 196 b, and the columnspacers 194 a and 194 b may be integrally formed of the same materialthrough one patterning process.

The arrangement and the size of the added portions 196 a and 196 b maybe properly determined in accordance with arrangement of the lightblocking pattern 192 and the column spacers 194 a and 194 b. Forexample, referring to FIG. 3, in the case where the column spacers 194 aand 194 b are arranged in a center portion of the width W2 of the lightblocking pattern 192, the added portions 196 a and 196 b may beimplemented by a structure projected/branched from the width W2 to oneside and the other side thereof. That is, the added portions 196 a and196 b may include a first added portion 196 a that projects from thelight blocking pattern 192 having width W2 to one side thereof, and asecond added portion 196 b that projects from the light blocking pattern192 having width W2 to the other side thereof that is opposite to theone side. The width W1 and the length L1 of the first added portion 196a may be the same as the width W1 and the length L1 of the second addedportion 196 b. In this case, the width (W2+2W1) of a portion in whichthe added portions 196 a and 196 b are formed may be wider than thewidth W2 of a portion in which the added portions 196 a and 196 b arenot formed by 2W1. However, this is exemplary, any one of the firstadded portion 196 a and the second added portion 196 b may be arrangedor the first added portion 196 a and the second added portion 196 b maybe arranged with different sizes in accordance with the arrangementbetween the light blocking pattern 192 and the column spacers 194 a and194 b.

In some embodiments, shapes of the added portions 196 a and 196 b in aplan view may be a rectangular shape as illustrated in FIG. 3. However,this is exemplary, and the shape of the added portions 196 a and 196 bis not limited thereto, but may be implemented in various shapes, suchas a polygon and a circle.

On the other hand, in the case where the column spacers 194 a and 194 band the light blocking pattern 192 are simultaneously formed of the samematerial in a body using a halftone mask, the above-described formingprocess may generally include a bake process for curing developedphotoresist. In this case, since the light blocking pattern 192 and thecolumn spacers 194 a and 194 b are integrally formed, the photoresistmay reflow after the bake process is performed. Accordingly, the shapeof the column spacers 194 a and 194 b may not be maintained as it isformed, but may be deformed, and this may cause difficulty in formingthe column spacers 194 a and 194 b with a desired height.

Accordingly, the liquid crystal display 10 according to an embodiment ofthe present inventive concept includes open portions 192 a-1 and 192 a-2formed in the light blocking pattern 192 which prevent or suppressreflow of the column spacers 194 a and 194 b. The open portions 192 a -1and 192 a-2 can prevent or suppress reflow of the column spacers 194 aand 194 b toward the light blocking pattern 192 after the bake processis performed due to the step height of the light blocking pattern 192,and through this, it becomes possible to form the column spacers 194 aand 194 b with a desired height.

For example, referring to FIG. 3, the light blocking pattern 192 mayinclude a first light blocking pattern and a second light blockingpattern having shapes extending in the same direction as the extensiondirection of the gate wirings 102 and 104. Here, the first lightblocking pattern indicates a portion of the light blocking pattern 192,in which the main column spacer 194 a is formed on the upper portionthereof, and the second light blocking pattern indicates a portion ofthe light blocking pattern 192, in which the main column spacer 194 a isnot formed. The light blocking pattern 192 may include open portions 192a-1 and 192 a-2 formed between the first light blocking pattern and thesecond light blocking pattern. The open portions 192 a-1 and 192 a-2 maybe formed to be spaced apart from the main column spacer 194 a for apredetermined distance. However, although the main column spacer 194 ais exemplified, substantially the same structure may be applied even tothe sub-column spacer 194 b.

In some embodiments, the open portions 192 a-1 and 192 a-2 may include afirst open portion 192 a-1 and a second open portion 192 a-2 asillustrated in FIG. 3. The first open portion 192 a-1 may be arranged tobe disposed on one side (left side in the drawing) of the main columnspacer 194 a, and the second open portion 192 a-2 may be arranged to bedisposed on the other side (that is opposite to the one side and rightside in the drawing) of the main column spacer 194 a. The first openportion 192 a-1 and the second open portion 192 a-2 may be arranged tobe bilaterally symmetric having a center of the main column spacer 194 aas an axis of symmetry. From another view point, the second open portion192 a-2 may be arranged to be spaced toward one side (left side in thedrawing) of the sub-column spacer 194 b, and the other open portion maybe arranged to be spaced toward the other side (that is opposite to theone side and right side in the drawing) of the sub-column spacer 194 b.The first open portion 192 a-1 and the other open portion may bearranged to be bilaterally symmetric having a center of the sub-columnspacer 194 b as an axis of symmetry. However, this is exemplary, and thearrangement of the open portions 192 a-1 and 192 a-2 is not limitedthereto.

In some embodiments, the open portions 192 a-1 and 192 a-2 may beimplemented by an open type structure. For example, in the embodiment ofFIGS. 2 and 3, the first open portion 192 a-1 and the second openportion 192 a-2 may be implemented by an open type structure in whichinner walls in left and right directions in the drawing are made of thelight blocking pattern 192 and inner walls in upper and lower directionsin the drawing are opened. In this case, the portion of the lightblocking pattern 192 in which the column spacers 194 a and 194 b areformed on the upper portion thereof (first light blocking pattern) maybe implemented to be separated/disconnected from the other portion ofthe light blocking pattern 192 (second light blocking pattern) throughthe open portions 192 a-1 and 192 a-2. In other words, as illustrated inFIG. 3, the portion of the light blocking pattern 192 in which the maincolumn spacer 194 a is formed on the upper portion thereof (first lightblocking pattern) may be implemented in an island shape by the firstopening portion 192 a-1 and the second opening portion 192 a-2. However,this is exemplary, and even if the open portions 192 a-1 and 192 a-2 areimplemented by the open type structure, they may be implemented only inany one direction, an upper direction or a lower direction, rather thanin the upper and lower directions in the drawing.

In some embodiments, the width W2 of the light blocking pattern 192 maybe about 26 μm, the width W1 of the added portions 196 a and 196 b maybe about 9.5 μm, the diameter of the column spacers 194 a and 194 b maybe about 10 μm, and the width L1 of the added portions 196 a and 196 bin the left and right directions in the drawing may be about 45 μm. Inthis case, the widths WD of the open portions 192 a-1 and 192 a-2 thatare formed on the light blocking pattern 192 may be about 3.5 μm to 4.5μm. However, such dimensions are exemplary, and the present inventiveconcept is not limited thereto.

In the embodiment of FIGS. 1 to 3, it is exemplified that the distancebetween the column spacers 194 a and 194 b and the open portions 192 a-1and 192 a-2 is about a half of the pixel pitch, but is not limitedthereto. The distance between the column spacers 194 a and 194 b and theopen portions 192 a-1 and 192 a-2 may be about the pixel pitch, forexample, about 27 μm to 29 μm. In this case, the first light blockingpattern may have a length corresponding to about double the pixel width(a short side of the pixel).

In some embodiments, the open portions 192 a-1 and 192 a-2 may beimplemented in a rectangular shape in a plan view. Specifically, theopen portions 192 a-1 and 192 a-2 may be implemented in a rectangularshape that extends in a projection direction of the gate electrode 104or an extension direction of the data line 132, that is, in arectangular shape that extends in the upper and lower directions in thedrawing. In other words, the opening portions may be implemented in arectangular shape that extends in a direction that is vertical to theextension direction of the light blocking pattern 192. However, this isexemplary, and the shape of the open portions 192 a-1 and 192 a-2 is notlimited thereto.

On the other hand, in order to prevent the occurrence of light leakagethrough the open portions 192 a-1 and 192 a-2 formed on the lightblocking pattern 192, the liquid crystal display 10 according to anembodiment of the present inventive concept may be implemented toinclude a metal layer that is arranged on lower portions of the openportions 192 a-1 and 192 a-2 to overlap at least a part of the openportions 192 a-1 and 192 a-2. For example, the open portions 192 a-1 and192 a-2 may be implemented to have a structure that overlaps the gatewirings 102 and 104. Specifically, as illustrated in FIG. 3, the firstopen portion 192 a-1 may be implemented by a structure which overlaps atleast partly a portion of the gate wirings 102 and 104 arranged in thefirst pixel, in which the gate electrode 104 is formed, and the secondopen portion 192 a-2 may be implemented by a structure which overlaps atleast partly a portion of the gate wirings 102 and 104 arranged on thesecond pixel, in which the gate electrode 104 is formed. Like theembodiment of FIG. 3, the open portions 192 a-1 and 192 a-2 may beimplemented to include a portion that does not overlap the gateelectrode 104. However, this is merely exemplary, and the implementationof the open portions 192 a-1 and 192 a-2 is not limited thereto. Theopen portions 192 a-1 and 192 a-2 may be implemented to completelyoverlap the gate wiring 101. Further, a lower metal that overlaps theopen portions 192 a-1 and 192 a-2 is not limited to the gate wirings 101and 104. The open portions 192 a-1 and 192 a-2 may be implemented by astructure that overlaps the data wirings 132, 134 and 136, or may beimplemented by a structure that overlaps a separate metal layer.

In some embodiments, like the embodiment of FIGS. 1 to 3, the lightblocking pattern 102 may be implemented to include aseparated/disconnected shape by the open in portions 192 a-1 and 192a-2, but is not limited thereto. The light blocking pattern 192 may beimplemented in a continuously connected shape through a third lightblocking pattern having a height that is lower than the height of theportion of the light blocking pattern 192 (first light blockingpattern), in which the main column spacer 194 a is formed on the upperportion thereof and which is arranged in a position corresponding to theopen portions 192 a-1 and 192 a-2, and the height of the portion of thelight blocking pattern 192 (second light blocking pattern), in which themain column spacer 194 a is not formed.

FIG. 4 is a cross-sectional view taken along a line that corresponds toline II-II′ of FIG. 1 illustrating a liquid crystal display according toanother embodiment of the present inventive concept, and FIG. 5 is aplan view explaining an arrangement relationship between a lightblocking pattern and a gate wiring of a liquid crystal display accordingto another embodiment of the present inventive concept.

Referring to FIGS. 4 and 5, a liquid crystal display 20 according toanother embodiment of the present inventive concept is different fromthe liquid crystal display 10 as described above with reference to FIGS.1 to 3 on that light blocking patterns 198 a and 198 b have differentconfigurations from those of the liquid crystal display 10, but otherconfigurations are the same as or are similar to those of the liquidcrystal display 10 as described above. Hereinafter, explanation will bemade about differences except for the duplicate portion.

In this embodiment, the third light blocking patterns 198 a and 198 bare arranged between the first light blocking pattern and the secondlight blocking pattern, which extend in the same direction as theextension direction of the gate wirings 102 and 104. Here, the firstlight blocking pattern indicates a portion of the light blocking pattern192, in which the main column spacer 194 a is formed on the upperportion thereof, and the second light blocking pattern indicates aportion of the light blocking pattern 192, in which the main columnspacer 194 a is not formed. The height of the third light blockingpatterns 198 a and 198 b is lower than the height of the first andsecond light blocking patterns. That is, a step may be formed betweenthe first light blocking pattern/the second light blocking pattern andthe third light blocking patterns 198 a and 198 b.

The third light blocking patterns 198 a and 198 b may be made of thesame material as the material of the first light blocking pattern andthe second light blocking pattern. The third light blocking patterns 198a and 198 b may be integrally formed with the first light blockingpattern and the second light blocking pattern. That is, the third lightblocking patterns 198 a and 198 b may include a portion that isconnected to the first light blocking pattern and the second lightblocking pattern.

In some embodiments, the third light blocking patterns 198 a and 198 bmay include the (3-1)-th light blocking pattern 198 a and the (3-2)-thlight blocking pattern 198 b. The (3-1)-th light blocking pattern 198 amay be arranged to be spaced apart from the main column spacer 194 a toone side (left side in the drawing), and the (3-2)-th light blockingpattern 198 b may be arranged to be spaced apart from the main columnspacer 194 a to the other side (opposite to the one side, and right sidein the drawing). The (3-1)-th light blocking pattern 198 a and the(3-2)-th light blocking pattern 198 b may be arranged to be bilaterallysymmetric having a center of the main column spacer 194 a as an axis ofsymmetry. From another view point, the (3-2)-th light blocking pattern198 b may be arranged to be spaced apart from the sub-column spacer 194b to one side, and although not illustrated, the other light blockingpattern may be arranged to be spaced apart from the sub-column spacer194 a to the other side. The (3-2)-th light blocking pattern 198 b andthe other light blocking pattern (not illustrated) may be arranged to bebilaterally symmetric having a center of the sub-column spacer 194 b asan axis of symmetry. However, this is exemplary, and the arrangement ofthe third light blocking patterns 198 a and 198 b is not limitedthereto.

The height of the (3-1)-th light blocking pattern 198 a and the (3-2)-thlight blocking pattern 198 b is lower than the height of the lightblocking pattern 192 as illustrated in FIG. 4. That is, the lightblocking pattern 192 may include a step that is caused by the (3-1)-thlight blocking pattern 198 a and the (3-2)-th light blocking pattern 198b. The first light blocking pattern or the second light blocking patternmay be arranged on the left and right sides of the (3-1)-th lightblocking pattern 198 a and the (3-2)-th light blocking pattern 198 b ina plan view, and the light blocking pattern 192 may not be arranged inthe upper and lower directions in a plan view.

In the embodiment of FIGS. 4 and 5, the shapes of the (3-1)-th lightblocking pattern 198 a and the (3-2)-th light blocking pattern 198 b maybe rectangular in a plan view. However, this is exemplary, and theshapes of the third light blocking patterns 198 a and 198 b are notlimited thereto.

The liquid crystal display 20 according to another embodiment of thepresent inventive concept may be implemented to include a metal layerthat is arranged on lower portions of the third light blocking patterns198 a and 198 b to overlap the third light blocking patterns 198 a and198 b. For example, the third light blocking patterns 198 a and 198 bmay be implemented by a structure that overlaps the gate wirings 102 and104. Specifically, as illustrated in FIG. 5, the (3-1)-th light blockingpattern 198 a may be implemented by a structure which overlaps at leasta portion of the gate wirings 102 and 104 arranged in the first pixel,in which the gate electrode 104 is formed, and the (3-2)-th lightblocking pattern 198 b may be implemented by a structure which overlapsat least a portion of the gate wirings 102 and 104 arranged on thesecond pixel, in which the gate electrode 104 is formed. Like theembodiment of FIG. 5, the third light blocking patterns 198 a and 198 bmay be implemented to include a portion that does not overlap the gateelectrode 104. However, this is merely exemplary, and a lower metal thatoverlaps the third light blocking patterns 198 a and 198 b is notlimited to the gate wirings 101 and 104. The third light blockingpatterns 198 a and 198 b may be implemented to completely overlap thegate wiring 101. The third light blocking patterns 198 a and 198 b maybe implemented by a structure that overlaps the data wirings 132, 134and 136, or may be implemented by a structure that overlaps a separatemetal layer.

In this embodiment, reflow of the column spacers 194 a and 194 b towardthe light blocking pattern 192 can be prevented or suppressed after thebake process is performed due to the step height that is caused by thethird light blocking patterns 198 a and 198 b, and through this, itbecomes possible to form the column spacers 194 a and 194 b with adesired height.

In some embodiments, the light blocking pattern 192 may be implementedto include the open type open portions 192 a-1 and 192 a-2 in the samemanner as the embodiment of FIGS. 1 to 3, but is not limited thereto.The light blocking pattern may also be implemented to include closedtype open portions.

FIG. 6 is a plan view explaining an arrangement between a light blockingpattern and a gate wiring of a liquid crystal display according to stillanother embodiment of the present inventive concept.

Referring to FIG. 6, a liquid crystal display 30 according to stillanother embodiment of the present inventive concept is different fromthe liquid crystal display 10 as described above with reference to FIGS.1 to 3 on that open portions 192 a-3 and 192 a-4 have differentconfigurations from those of the liquid crystal display 10, but otherconfigurations are the same as or are similar to those of the liquidcrystal display 10 as described above. Hereinafter, explanation will bemade about the differences except for the duplicate portion.

The open portions 192 a-3 and 192 a-4 of the liquid crystal display 30according to still another embodiment of the present inventive conceptinclude a first open portion 192 a-3 and a second open portion 192 a-4.The first open portion 192 a-3 may be arranged to be spaced apart fromthe main column spacer 194 a to one side, and the second open portion192 a-4 may be arranged to be spaced apart from the main column spacer194 a to the other side (opposite to the one side). The first openportion 192 a-3 and the second open portion 192 a-4 may be arranged tobe bilaterally symmetric having a center of the main column spacer 194 aas an axis of symmetry. From another view point, the second open portion192 a-4 may be arranged to be spaced apart from the sub-column spacer194 b to one side, and although not illustrated, the other open portionmay be arranged to be spaced apart from the sub-column spacer 194 a tothe other side. The second open portion 192 a-4 and the other openportion may be arranged to be bilaterally symmetric having a center ofthe sub-column spacer 194 b as an axis of symmetry. However, this isexemplary, and the arrangement of the open portions 192 a-3 and 192 a-4is not limited thereto.

On inner walls of the first open portion 192 a-3 and the second openportion 192 a-4, a light blocking pattern 192 may be arranged. That is,the first open portion 192 a-3 and the second open portion 192 a-4 maybe implemented by a closed structure that is surrounded by the lightblocking pattern 192.

In some embodiments, the shapes of the first open portion 192 a-3 andthe second open portion 192 a-4 may be rectangular in a plan view asillustrated in FIG. 6. However, this is exemplary, and the shapes arenot limited thereto. In the case where the shapes of the first openportion 192 a-3 and the second open portion 192 a-4 are implemented tobe rectangular, the first open portion 192 a-3 and the second openportion 192 a-4 may have a closed type open structure in which innerwalls in the left, right, upper, and lower directions in a plan view arecovered by the light blocking pattern 192. That is, even if the lightblocking pattern 102 includes the first open portion 192 a-3 and thesecond open portion 192 a-4, it may be implemented in a continuous shaperather than in a disconnected shape.

On the other hand, in order to prevent the occurrence of light leakagethrough the open portions 192 a-3 and 192 a-4 formed on the lightblocking pattern 192, the liquid crystal display 30 according to stillanother embodiment of the present inventive concept may be implementedby a structure in which the open portions 192 a-3 and 192 a-4 and lowermetals overlap each other. For example, the open portions 192 a-3 and192 a-4 may be implemented by a structure that overlaps the gate wirings102 and 104. Specifically, as illustrated in FIG. 6, the first openportion 192 a-3 may be implemented by a structure that overlaps aportion of the gate wirings 102 and 104 arranged in the first pixel, inwhich the gate electrode 104 is formed, and the second open portion 192a-4 may be implemented by a structure that overlaps a portion of thegate wirings 102 and 104 arranged on the second pixel, in which the gateelectrode 104 is formed. In this case, the open portions 192 a-3 and 192a-4 may completely overlap the gate wirings 102 and 104. In other words,the open portions 192 a-3 and 192 a-4 may be arranged in an inner regionof a portion of the gate wirings 102 and 104, in which the gateelectrode 104 is formed. In this embodiment, it is exemplified that thelower metals that overlap the open portions 192 a-3 and 192 a-4 are thegate wirings 102 and 104, but are not limited thereto. The open portions192 a-3 and 192 a-4 may be implemented by a structure that overlaps thedata wirings 132, 134 and 136, or may be implemented by a structure thatoverlaps a separate metal layer.

In this embodiment, reflow of the column spacers 194 a and 194 b towardthe light blocking pattern 192 can be prevented or suppressed after thebake process is performed due to the step height that is caused by theclosed type open portions 192 a-3 and 192 a-4 formed on the lightblocking pattern 192, and through this, it becomes possible to form thecolumn spacers 194 a and 194 b with a desired height.

In some embodiments, the light blocking pattern 192 may be implementedto include the closed type open portions 192 a-3 and 192 a-4 asillustrated in FIG. 6. However, this is exemplary, and the lightblocking pattern 192 may be implemented to include a third lightblocking pattern having a lower height than the height of the adjacentportions instead of the closed type open portions 192 a-3 and 192 a-4.

FIG. 7 is a plan view explaining an arrangement between a light blockingpattern and a gate wiring of a liquid crystal display according to stillanother embodiment of the present inventive concept.

Referring to FIG. 7, a liquid crystal display 40 according to stillanother embodiment of the present inventive concept is different fromthe liquid crystal display 30 as described above with reference to FIG.6 on that third light blocking patterns 198 a-1 and 198 b-1 havedifferent configurations from those of the liquid crystal display 30,but other configurations are the same as or are similar to those of theliquid crystal display 30 as described above. Hereinafter, explanationwill be made about the differences except for the duplicate portion.

The third light blocking patterns 198 a-1 and 198 b-1 may be formedinside the light blocking pattern 192. The third light blocking patterns198 a-1 and 198 b-1 may have a step height that is lower than the stepheight of the adjacent portions. That is, the third light blockingpatterns 198 a-1 and 198 b-1 may be implemented by a structure that issurrounded by a peripheral portion having a relatively high height.

The third light blocking patterns 198 a-1 and 198 b-1 are arrangedbetween the first light blocking pattern and the second light blockingpattern, which extend in the same direction as the extension directionof the gate wirings 102 and 104. Here, the first light blocking patternindicates a portion of the light blocking pattern 192, in which the maincolumn spacer 194 a is formed on the upper portion thereof, and thesecond light blocking pattern indicates a portion of the light blockingpattern 192, in which the main column spacer 194 a is not formed.

Referring to FIG. 7, in some embodiments, the first light blockingpattern and the second light blocking pattern may be implemented in aconnected shape by the light blocking pattern portions arranged on anupper portion and a lower portion of the third light blocking patterns198 a-1 and 198 b-1 in a plan view. However, this is exemplary, and theconnected shape of the first light blocking pattern and the second lightblocking pattern is not limited thereto.

The third light blocking patterns 198 a-1 and 198 b-1 may be made of thesame material as the material of the first light blocking pattern andthe second light blocking pattern. The third light blocking patterns 198a-1 and 198 b-1 may be integrally formed with the first light blockingpattern and the second light blocking pattern. In some embodiments, thethird light blocking patterns 198 a-1 and 198 b-1 may include the(3-1)-th light blocking pattern 198 a-1 and the (3-2)-th light blockingpattern 198 b-1. The (3-1)-th light blocking pattern 198 a-1 may bearranged to be spaced apart from the main column spacer 194 a to oneside, and the (3-2)-th light blocking pattern 198 b-1 may be arranged tobe spaced apart from the main column spacer 194 a to the other side(opposite to the one side). The (3-1)-th light blocking pattern 198 a-1and the (3-2)-th light blocking pattern 198 b-1 may be arranged to bebilaterally symmetric having a center of the main column spacer 194 a asan axis of symmetry. From another view point, the (3-2)-th lightblocking pattern 198 b-1 may be arranged to be spaced apart from thesub-column spacer 194 b to one side, and although not illustrated, theother light blocking pattern may be arranged to be spaced apart from thesub-column spacer 194 a to the other side. The (3-2)-th light blockingpattern 198 b-1 and the other light blocking pattern may be arranged tobe bilaterally symmetric having a center of the sub-column spacer 194 bas an axis of symmetry. However, this is exemplary, and the arrangementof the third light blocking patterns 198 a-1 and 198 b-1 is not limitedthereto.

In some embodiments, the shapes of the (3-1)-th light blocking pattern198 a-1 and the (3-2)-th light blocking pattern 198 b-1 may berectangular in a plan view as illustrated in FIG. 7. However, this isexemplary, and the shapes of the third light blocking patterns 198 a-1and 198 b-1 are not limited thereto. The liquid crystal display 40according to still another embodiment of the present inventive conceptmay be implemented to include a metal layer that is arranged on lowerportions of the third light blocking patterns 198 a-1 and 198 b-1 tooverlap the third light blocking patterns 198 a-1 and 198 b-1. Forexample, the third light blocking patterns 198 a-1 and 198 b-1 may beimplemented to overlap the gate wirings 102 and 104. However, this ismerely exemplary, and the third light blocking patterns 198 a-1 and 198b-1 may be implemented to overlap the data wirings 132, 134 and 136, ormay be implemented to overlap a separate metal layer.

In this embodiment, reflow of the column spacers 194 a and 194 b towardthe light blocking pattern 192 can be prevented or suppressed after thebake process is performed due to the step height that is caused by thethird light blocking patterns 198 a-1 and 198 b-1, and through this, itbecomes possible to form the column spacers 194 a and 194 b with adesired height.

In some embodiments, the width W2 of the light blocking pattern 192 inupper and lower directions in a plan view may be wider than the width W3of the gate wiring of a portion in which the gate electrode 104 isformed as in the embodiment of FIGS. 1 to 3. However, this is exemplary,and the width of the light blocking pattern 192 may be implemented to besubstantially equal to the width of the gate wiring of a portion inwhich the gate electrode 104 is formed.

FIG. 8 is a plan view explaining an arrangement between a light blockingpattern and a gate wiring of a liquid crystal display according to stillanother embodiment of the present inventive concept.

Referring to FIG. 8, a liquid crystal display 50 according to stillanother embodiment of the present inventive concept is different fromthe liquid crystal display 10 as described above with reference to FIGS.1 to 3 on that the light blocking pattern 192 has a different width, butother configurations are the same as or are similar to those of theliquid crystal display 10 as described above. Hereinafter, explanationwill be made about the differences except for the duplicate portion.

In some embodiments, the width W4 of the light blocking pattern 192 inupper and lower directions in a plan view may be substantially equal tothe width W4 of the gate wiring of a portion in which the gate electrode104 is formed. Accordingly, as illustrated in FIG. 8, open portions 192a-5 and 192 a-6 that are formed on the light blocking pattern 192 maycompletely overlap a portion of the gate wirings 102 and 104, in whichthe gate electrode 104 is formed. However, this is exemplary, and thepresent inventive concept is not limited to such a structure.

In some embodiments, the width W2 of the light blocking pattern 192 inupper and lower directions in a plan view may be wider than the width W3of the gate wiring of a portion in which the gate electrode 104 isformed as in the embodiment of FIGS. 1 to 3. However, this is exemplary,and the width of the light blocking pattern 192 may be narrower than thewidth of the gate wiring of the portion in which the gate electrode 104is formed.

FIG. 9 is a plan view explaining an arrangement relationship between alight blocking pattern and a gate wiring of a liquid crystal displayaccording to still another embodiment of the present inventive concept.

Referring to FIG. 9, a liquid crystal display 60 according to stillanother embodiment of the present inventive concept is different fromthe liquid crystal display 10 as described above with reference to FIGS.1 to 3 on that the light blocking pattern 192 has a different width, butother configurations are the same as or are similar to those of theliquid crystal display 10 as described above. Hereinafter, explanationwill be made about the differences except for the duplicate portion.

In some embodiments, the width W5 of the light blocking pattern 192 inupper and lower directions in the drawing may be narrower than the widthW6 of the gate wiring of a portion in which the gate electrode 104 isformed. Accordingly, as illustrated in FIG. 9, open portions 192 a-1 and192 a-2 that are formed on the light blocking pattern 192 may bearranged on an inner region of the gate wiring region in which the gateelectrode 104 is formed. Accordingly, the open portions 192 a-1 and 192a-2 may completely overlap a portion of the gate wirings, in which thegate electrode 104 is formed.

Next, a method for manufacturing a liquid crystal display 10 accordingto an embodiment of the present inventive concept as described abovewill be described.

FIGS. 10 to 24 are cross-sectional views of processing steps explaininga method for manufacturing a liquid crystal display according to anembodiment of the present inventive concept.

First, referring to FIGS. 1, 2, and 10, gate wirings 102 and 104 areformed on a first substrate 100.

A first metal layer (not illustrated) is formed on the first substrate100 that includes glass and quartz. The first metal layer (notillustrated) may be formed of aluminum, copper, silver, molybdenum,chrome, titanium, tantalum, or an alloy thereof, and may include two ormore layers having different physical properties. The first metal layer(not illustrated) is deposited, for example, by a sputtering process.Then, the gate wirings 102 and 104 that include a gate line 102 and agate electrode 104 are formed by patterning the first metal layer (notillustrated) through a photo etching process using an exposure mask. Thegate electrode 104 may be branched from the gate line 102 in the form ofa projection.

Next, referring to FIG. 11, a gate insulating layer 112 is formed on thegate wirings 102 and 104. The gate insulating layer 112 may be formedthrough PECVD (Plasma Enhanced Chemical Vapor Deposition), and mayinclude silicon nitride (SiNx) or silicon oxide (SiO2).

Next, referring to FIG. 12, a semiconductor layer 122 and an ohmiccontact layer 124 are formed on the gate insulating layer 112. Thesemiconductor layer 122 may be formed using hydrogenated amorphoussilicon or polysilicon. The semiconductor layer 122 and the ohmiccontact layer 124 may be formed through a photo etching process.

Next, referring to FIGS. 1 and 13, data wirings 132, 134, and 136 thatinclude a data line 132, a source electrode 134, and a drain electrode136, which define a unit pixel to cross the gate line, are formed on thegate insulating layer 112, the semiconductor layer 122, and the ohmiccontact layer 124 through a photo etching process. In the same manner asthe gate wirings 102 and 104, the data wirings 132, 134, and 136 may beformed of aluminum, copper, silver, molybdenum, chrome, titanium,tantalum, or an alloy thereof, and may include two or more layers havingdifferent physical properties.

In this embodiment, it is exemplified that the semiconductor layer 122and the ohmic contact layer 124 and the data wirings 132, 134, and 136are formed through separate photo etching processes, but the formingmethod are not limited thereto. The semiconductor layer 122, the ohmiccontact layer 124, and the data wirings 132, 134, and 136 may be formedthrough a photo etching process using one mask. In this case, thesemiconductor layer 122 and the ohmic contact layer 124 may remain underthe data line 132. In other words, the semiconductor layer 122 and theohmic contact layer may have the same configuration as the data wiring132, 134 and 136. The semiconductor layer 122 may form a thin filmtransistor together with the gate electrode 104, the source electrode134, and the drain electrode 136, and may form a channel.

Next, referring to FIG. 14, a first passivation layer 142-1 is formed onthe first substrate 102 on which the thin film transistor is formed. Thefirst passivation layer 142-1 may be formed of, for example, aninorganic material, such as silicon nitride or silicon oxide, or amaterial of a-Si:C:O or a-Si:O:F that is formed by PECVD (PlasmaEnhanced Chemical Vapor Deposition).

Next, referring to FIG. 15, a color filter 152 is formed on the firstpassivation layer 142-1. The color filter 152 may be arranged in a pixelregion, and may include an R (Red) color filter, a G (Green) colorfilter, and a B (Blue) color filter. The color filter 152 may be formedof a photosensitive organic material including pigment.

The color filter 152 may be formed by a photo etching process or aninkjet printing method, and other various methods may be applied to formthe color filter 152.

Next, referring to FIG. 16, a first organic layer 154-1 is formed on thefirst passivation layer 142-1 and the color filter 152. The firstorganic layer 154-1 has superior planarization characteristics, and maybe formed of a material having photosensitivity. The first organic layer154-1 may be formed by a spin coating method or a slit coating method,or may be formed using both the spin coating method and the slit coatingmethod.

Next, referring to FIG. 17, a contact hole 136 a for exposing at least aportion of the drain electrode 136 is formed on the first passivationlayer 142-1 and the first organic layer 154-1. Specifically, the contacthole 136 a is formed through the first organic layer 154-1, and then thefirst passivation layer 142 may be removed using the contact hole 136 aformed through the first organic layer 154-1 as a etch mask.

Next, referring to FIG. 18, a common electrode 162 is formed on theorganic layer 154. The common electrode 162 may include an opening forexposing a region in which the contact hole 136 a is formed. The commonelectrode 162 may be integrally formed on the whole pixel regions exceptfor the opening. The common electrode 162 may be formed of a transparentconductive material, such as polycrystalline, single crystalline, oramorphous ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide), but is notlimited thereto.

Next, referring to FIG. 19, a second passivation layer 172 is formed onthe common electrode 162 and the organic layer 154. The secondpassivation layer 172 may include an opening for exposing a region inwhich the contact hole 136 a is formed. The second passivation layer 172may be formed through a process of depositing an inorganic insulatingmaterial, for example, silicon nitride or silicon oxide, onto the commonelectrode 162 and the organic layer 154 and a process of removing theregion in which the contact hole 136 a is formed using a conventionalphotolithography technology.

Next, referring to FIG. 20, a pixel electrode 182 is formed on thesecond passivation layer 172 and the organic layer 154. Specifically,the pixel electrode 182 may be formed to come in contact with at least aportion of the drain electrode 136 that is exposed through the openingformed on the second passivation layer 172 and the contact hole 136 aformed on the organic layer 154 and the first passivation layer 142.Through this contact, the pixel electrode 182 may be electricallyconnected/contacted to the drain electrode 136.

Next, referring to FIG. 21, a light blocking layer 191 is formed on thepixel electrode 182 and the second passivation layer 172. The lightblocking layer 191 may include a black organic polymer materialincluding black dye or pigment, or metal (metal oxide), such as chromeor chrome oxide. In this embodiment, it is exemplified that the lightblocking layer 191 is made of negative photoresist, but is not limitedthereto. The light blocking layer 191 may be implemented by positivephotoresist.

Next, referring to FIGS. 22 and 23, the light blocking layer 191 isexposed and developed using an exposure mask 400. FIG. 22 shows aprocess of exposing the light blocking layer 191 using the exposure mask400, and FIG. 23 shows a state where a light blocking layer pattern191-1 is formed through the exposing and developing of the lightblocking layer 101.

The exposure mask 400 may include a first halftone regions 402, a secondhalftone regions 406, a light transmission regions 404, and a lightblocking regions 408. The transmission of irradiated light L becomeshigh in the order of the light transmission regions 404, the secondhalftone regions 406, the first halftone regions 402, and the lightblocking regions 408. For example, as illustrated in FIG. 22, a part ofthe irradiated light L may transmit through the first halftone regions402 and the second halftone regions 406, and the transmission degree ofthe light L of the first halftone regions 402 may be lower than thetransmission degree of the light L of the second halftone regions 406.The whole irradiated light L may transmit through the light transmissionregions 404, but is not limited thereto. The whole irradiated light Lmay be blocked through the light blocking regions 408.

Next, referring to FIGS. 23 and 24, a bake process is performed as aprocess for curing the light blocking layer pattern 191-1 to form alight blocking pattern 192 and column spacers 194 a and 194 b. FIG. 24illustrates a state where the light blocking pattern 192 and the columnspacers 194 a and 194 b are formed through the bake process.

A main column spacer 194 a may be formed on a portion of the lightblocking layer 191 that corresponds to the light transmission regions404 on the exposure mask 400. The light blocking pattern 192 may beformed on the portion of the light blocking layer 101 that correspondsto the second halftone regions 406. The portion of the light blockinglayer 191 that corresponds to the light blocking regions 408 is aportion to be removed, and through this, open portions 192 a-1 and 192a-2 of the light blocking pattern 192 may be formed.

In some embodiments, as can be confirmed through FIGS. 23 and 24, afterthe bake process is performed, the size of the light blocking layerpattern 191-1 may be somewhat reduced to form column spacers 194 a and194 b. However, according to the method for manufacturing the liquidcrystal display according to an embodiment of the present inventiveconcept, since the open portions 192 a-1 and 192 a-2 are formed in theneighborhood of the column spacers 194 a and 194 b, reflow of the columnspacers 194 a and 194 b toward the light blocking pattern 192 can beprevented or suppressed, and through this, it becomes possible to securecolumn spacer step height of a desired level.

Next, referring to FIG. 25, an alignment layer (not illustrated) isformed on the first substrate 100 and the second substrate 200. Next, aliquid crystal layer 300 is formed by spreading liquid crystal molecules(not illustrated) having positive dielectric anisotropy or negativedielectric anisotropy on the first substrate 100. Next, the firstsubstrate 100 on which the liquid crystal layer 300 is formed is coupledto the second substrate 200.

Next, a method for manufacturing a liquid crystal display 20 accordingto another embodiment of the present inventive concept as describedabove will be described.

The method for manufacturing the liquid crystal display 20 according toanother embodiment of the present inventive concept is different fromthe method for manufacturing the liquid crystal display 10 according toan embodiment of the present inventive concept as described abovethrough FIGS. 10 to 25 on the point that a process of patterning a lightblocking layer 191 is different from that according to an embodiment ofthe present inventive concept, but other processes are the same as orare similar to those according to an embodiment of the present inventiveconcept as described above. Hereinafter, explanation will be made aboutthe differences except for the duplicate portion.

FIG. 26 is a cross-sectional view explaining a process of forming alight blocking pattern and a column spacer in a method for manufacturinga liquid crystal display according to an embodiment of the presentinventive concept.

Referring to FIG. 26, in the method for manufacturing the liquid crystaldisplay according to another embodiment of the present inventiveconcept, a light blocking layer 191 is formed on a pixel electrode 182and a second passivation layer 172, and then the light blocking layer191 is patterned through a photo etching process using an exposure mask400-1. The exposure mask 400-1 may include a first halftone regions 412,a second halftone regions 416, a third halftone regions 418, and a lighttransmission regions 414.

The transmission of irradiated light L becomes high in the order of thelight transmission regions 414, the second halftone regions 416, thefirst halftone regions 412, and the third halftone regions 418. Forexample, as illustrated in FIG. 26, a part of the irradiated light L maytransmit through the first halftone regions 412, the second halftoneregions 416, and the third halftone regions 418, and the transmissiondegree of the light L may become high in the order of the secondhalftone regions 416, the first halftone regions 412, and the thirdhalftone regions 418. The whole irradiated light L may transmit throughthe light transmission regions 414, but is not limited thereto.

Referring to FIGS. 26 and 4, a main column spacer 194 a on a portion ofthe light blocking layer 191 that corresponds to the light transmissionregions 414 through a photo etching process using the exposure mask400-1. The light blocking pattern 192 a may be formed on the portion ofthe light blocking layer 191 that corresponds to the first halftoneregions 412. A sub-column spacer 194 b may be formed on the portion ofthe light blocking layer 191 that corresponds to the second halftoneregions 416. Third light blocking patterns 198 a and 198 b may be formedon the portion of the light blocking layer 191 that corresponds to thethird halftone regions 418.

Although preferred embodiments of the present inventive concept havebeen described for illustrative purposes, those skilled in the art willappreciate that various modifications, additions and substitutions arepossible, without departing from the scope and spirit of the inventiveconcept as disclosed in the accompanying claims.

What is claimed is:
 1. A liquid crystal display comprising: a firstsubstrate and a second substrate that are opposite to each other; aliquid crystal layer arranged between the first substrate and the secondsubstrate; a color filter disposed on the first substrate; a lightblocking pattern including a first light blocking pattern and a secondlight blocking pattern arranged along one direction in which the gatewiring extends; and a column spacer formed on the first light blockingpattern on the first substrate, wherein the light blocking patternincludes an open portion disposed between the first light blockingpattern and the second light blocking pattern, and formed to be spacedapart from the column spacer for a predetermined distance, and whereinthe column spacer completely overlaps the color filter.
 2. The liquidcrystal display of claim 1, further comprising a metal layer arranged ona lower portion of the open portion on the first substrate, wherein atleast a part of the open portion overlaps the metal layer.
 3. The liquidcrystal display of claim 1, further comprising a gate wiring arranged ona lower portion of the open portion on the first substrate and includinga gate line and a gate electrode, wherein at least a part of the openportion overlaps the gate wiring.
 4. The liquid crystal display of claim3, wherein the open portion overlaps a portion of the gate wiring inwhich the gate electrode is formed.
 5. The liquid crystal display ofclaim 1, wherein the first light blocking pattern and the second lightblocking pattern are separated from each other by the open portion. 6.The liquid crystal display of claim 1, wherein the open portioncomprises a first open portion spaced apart from the column spacer toone side for a predetermined distance, and a second open portion spacedapart toward the other side that is an opposite side of the one side fora predetermined distance.
 7. The liquid crystal display of claim 1,wherein the first light blocking pattern comprises an added portion thatprojects from an edge of the first light blocking pattern correspondingto the column spacer.
 8. The liquid crystal display of claim 1, whereina width of the added portion is from about 9 μm to about 10 μm.